Residual monomer release according to fluoride application | |||||
---|---|---|---|---|---|
Fluoride application | Material | TEGDMA | HEMA | UDMA | Bis-GMA |
Control | FBF | 0.235 (0.02–0.39)a | 11.91 (0.0–58.15)a | 10.70 (2.50–67.53)a | 6.22 (1.99–30.76)a |
DXP | 1.12 (0.0–2.48)b | 3.325 (1.25–5.78)b | 0.0 (0.0–0.0)b | 0.82 (0.38–5.65)b | |
Z550 | 0.125 (0.0–0.37)a | 0.08 (0.0–1.07)b | 7.42 (2.63–17.02)b | 4.105 (1.47–11.80)b | |
p = 0.000* | p = 0.000* | p = 0.000* | p = 0.000* | ||
APF | FBF | 0.2 (0.01–0.6)b | 6.05 (2.64–20.17)a | 5.56 (1.86–24.59)a | 3.2 (1.52–12.04)b |
DXP | 0.68 (0.29–2.03)a | 4.89 (1.9–8.76)b | 0.0 (0.0–0.0)b | 1.04 (0.0–3.23)c | |
Z550 | 0.086 (0.0–0.30)b | 0.23 (0.0–0.54)c | 7.53 (2.87–21.26)a | 4.25 (1.72–15.07)a | |
p = 0.000* | p = 0.000* | p = 0.000* | p = 0.000* | ||
NaF | FBF | 0.15 (0.0–0.48) | 8.77 (2.10–34.86)a | 10.16 (0.93–39.45)a | 4.92 (0.33–18.45)b |
DXP | 0.44 (0.17–1.08) | 4.87 (2.22–9.63)b | 0.0 (0.0–0.0)b | 0.78 (0.46–1.97)c | |
Z550 | 0.28 (0.11–3.32) | 1.06 (0.17–9.99)b | 13.87 (4.16–54.30)a | 10.99 (2.63–33.61)a | |
p = 0.056 | p = 0.000* | p = 0.000* | p = 0.000* |