Manufacturer | Composition | Classification | Material |
---|---|---|---|
3 M ESPE, St. Paul, MN, USA | Organic: 20 wt.% resin matrix (Bis-GMA, UDMA, Bis-EMA, TEGDMA) Fillers: SiO2 (20 nm), ZrO2 (4–11 nm), ZrO2/SiO2 nanoclusters (0.6–10 nm) Filler content: 80 wt.% nanoceramic | Resin nano ceramic | Lava Ultimate CAD/CAM blocks |
GC Corporation, Tokyo, Japan | Organic:29 wt.% resin matrix (UDMA, DMA, Bis-MEPP) Fillers: barium glass (300Â nm), SiO2 (20Â nm) Filler content: 71 wt.% nanoparticles | Flexible nano ceramic | Cerasmart CAD/CAM blocks |
Ultradent; South Jordan, UT, USA | Hydrofluoric acid 9% buffered | Hydrofluoric acid gel | Ultradent Porcelain Etch |
Renfert GmbH, Hilzingen, Germany | 99.5% Al2O3 (50 μm), SiO2 < 0.06% | Grit blasting particles | Cobra 50-μm Al2O3 powder |